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1Clear out junk files and repair common Windows errors2Scan for outdated or missing drivers - takes under a minute3Repair Windows errors before they cause bigger problemsNovellus announced in October 2000 that it planned to acquire Gasonics for about $347 million in stock. The deal, which closed on January 10, 2001, extended Novellus beyond thin-film deposition into photoresist stripping and wafer residue cleaning—steps the company believed could be better coordinated with deposition for copper and low-k interconnect manufacturing.
What Novellus announced—and when the deal closed
On October 26, 2000, EE Times reported that Novellus Systems planned to acquire Gasonics International in a stock-for-stock transaction valued at approximately $347 million. The reported exchange ratio was 0.52 Novellus shares for each Gasonics share. Those figures describe the proposed deal as reported at the time.
The transaction was completed several months later. Gasonics shareholders voted on January 9, 2001; Novellus said that over 99 percent of the shares present and voting supported the transaction. On January 10, Novellus announced the close and said outstanding Gasonics shares had been converted into approximately 9.24 million Novellus shares. The shareholder approval percentage applies to shares present and voting, not to all outstanding shares.
Why cleaning complemented Novellus’ deposition business
Novellus was known for depositing thin films used to build integrated circuits. Before a new film is deposited, a wafer may need surface preparation to remove photoresist or residue left by earlier process steps. Contamination or residue can affect the conditions for subsequent films and their adhesion.
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Gasonics brought equipment for photoresist stripping and residue removal. Novellus’ strategic thesis was that owning both surface-preparation and deposition capabilities could make it easier to coordinate those steps for advanced interconnect manufacturing, particularly copper dual-damascene processes and low-k dielectrics. That was the company’s rationale for the acquisition, not independent proof of a particular yield or performance gain.
In the announcement coverage, Novellus chairman and CEO Richard Hill said the company saw surface preparation as a manufacturing technology with a direct impact on interconnect yield and performance. He also argued that interactively optimizing preparation and deposition could help extend copper/low-k processes to advanced devices. These were expectations stated by Novellus when the deal was announced.
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What Gasonics added
Novellus’ 2001 Form 10-K described Gasonics as a developer and global supplier of photoresist and residue-removal solutions for advanced semiconductor manufacturing. It identified these historical tools:
- PEP 3510 Plus: a photoresist-strip system.
- GAMMA 2100: a photoresist-strip system.
- PEP IRIDIA: a residue-clean system.
The named models show the kind of process capability Gasonics contributed; they are historical product examples, not a statement about present-day sales or support.
Rank #3
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What changed after the acquisition
After closing, Gasonics became the nucleus of Novellus’ Surface Integrity Group, a new surface-preparation business. Novellus named former Gasonics CEO Asuri Raghavan to lead the unit. In a January 2001 post-close report, Hill described the combination as bringing Gasonics’ surface-preparation knowledge together with Novellus’ knowledge of deposition in copper dual-damascene manufacturing to address emerging interconnect challenges.
A 2006 Novellus notice later said selected 200 mm and 300 mm Surface Integrity products, including GAMMA and PEP IRIDIA, would continue to be sold and supported at that time. That dated notice does not establish current availability or support.
Quick Recap
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